Semiconductor device and manufacturing method thereof

ABSTRACT

A semiconductor device includes a semiconductor substrate in which a through hole is formed, a first wiring that is provided on a first surface of the semiconductor substrate, an insulating layer provided on an inner surface of the through hole and a second surface of the semiconductor substrate, and a second wiring that is provided on a surface of the insulating layer and electrically connected to the first wiring in an opening. The surface of the insulating layer includes a first region, a second region, a third region, a fourth region that is curved to continuously connect the first and the second regions, and a fifth region that is curved to continuously connect the second and the third regions. An average inclination angle of the second region is smaller than that of the first region and is smaller than that of the inner surface.

TECHNICAL FIELD

The present invention relates to a semiconductor device and amanufacturing method thereof.

BACKGROUND ART

In semiconductor devices such as an optical device and an electronicdevice, a front surface side and a rear surface side of thesemiconductor substrate are electrically connected to each other via athrough hole formed in the semiconductor substrate (for example, referto Patent Literature 1).

CITATION LIST Patent Literature

Patent Literature 1: Japanese Unexamined Patent Publication No.2004-57507

SUMMARY OF INVENTION Technical Problem

In the semiconductor device described above, there is a risk of anelectrical connection via a through hole in the semiconductor substratebeing weakened according to reduction in size thereof, high integration,and the like.

Here, an object of the present invention is to provide a semiconductordevice capable of forming a reliable electrical connection via a throughhole in a semiconductor substrate and a method of manufacturing such asemiconductor device.

Solution to Problem

According to one aspect of the present invention, there is provided asemiconductor device including a semiconductor substrate that has afirst surface and a second surface opposite to each other and in which athrough hole to extend from the first surface to the second surface isformed; a first wiring that is provided on the first surface and has aportion located above a first opening of the through hole on the firstsurface side; an insulating layer that is provided on an inner surfaceof the through hole and the second surface and is continuous through asecond opening of the through hole on the second surface side; and asecond wiring that is provided on a surface of the insulating layer andis electrically connected to the first wiring in an opening of theinsulating layer on the first surface side. The surface of theinsulating layer includes a tapered first region that reaches the firstopening inside the through hole and enlarges from the first surface tothe second surface, a tapered second region that reaches the secondopening inside the through hole and enlarges from the first surface tothe second surface, a third region that faces the second surface outsidethe through hole, a fourth region that is curved to continuously connectthe first region and the second region, and a fifth region that iscurved to continuously connect the second region and the third region.An average inclination angle of the second region is smaller than anaverage inclination angle of the first region and is smaller than anaverage inclination angle of the inner surface of the through hole.

In the semiconductor device, within the surface of the insulating layer,the first region that reaches the first opening of the through hole andthe second region that reaches the second opening of the through holeare tapered regions that enlarge from the first surface to the secondsurface of the semiconductor substrate. Thus, the average inclinationangle of the second region is smaller than the average inclination angleof the inner surface of the through hole. Accordingly, within thesurface of the insulating layer, an angle between the third region thatfaces the second surface of the semiconductor substrate and the secondregion that reaches the second opening of the through hole is greater(that is, gentler) than an angle between the second surface of thesemiconductor substrate and the inner surface of the through hole.Therefore, during manufacture and after manufacture, a disconnection ofthe second wiring in a portion of the second opening of the through holeis prevented. In addition, for example, compared to when the insulatinglayer is formed with a uniform thickness along the inner surface of thethrough hole, since the inclination of the second region becomesgentler, it is possible to form the second wiring easily and reliably.Further, since it is possible to form the second wiring withoutdepending on the shape of the inner surface of the through hole, forexample, even if a pointed portion remains on the inner surface of thethrough hole, it is possible to prevent a disconnection of the secondwiring caused by such a portion. In addition, the average inclinationangle of the second region is smaller than the average inclination angleof the first region. In other words, the average inclination angle ofthe first region that reaches the first opening of the through hole islarger than the average inclination angle of the second region.Accordingly, for example, even if the diameter of the through hole isreduced, a sufficient area of the opening of the insulating layer on thefirst surface side of the semiconductor substrate is ensured. Therefore,during manufacture and after manufacture, a disconnection between thefirst wiring and the second wiring in a portion of the opening of theinsulating layer is prevented. Further, on the surface of the insulatinglayer, the fourth region is curved to continuously connect the firstregion and the second region, and the fifth region is curved tocontinuously connect the second region and the third region. Therefore,during manufacture and after manufacture, a disconnection of the secondwiring is prevented in the entire region of the surface of theinsulating layer. In particular, after manufacture, since the stressconcentration in the entire region of the surface of the insulatinglayer is reduced, it is effective to prevent a disconnection of thesecond wiring. As described above, according to the semiconductordevice, a reliable electrical connection via the through hole in thesemiconductor substrate can be formed. Here, regarding the averageinclination angle of the inner surface of the through hole, a case inwhich the inner surface (when the inner surface of the through hole is acurved surface such as a cylindrical surface, the tangential plane ofthe curved surface) of the through hole is orthogonal to the firstsurface of the semiconductor substrate and the inner surface of thethrough hole has an angle of 90° with respect to the first surface isincluded.

In the semiconductor device according to one aspect of the presentinvention, the average inclination angle of the first region is closerto the average inclination angle of the inner surface of the throughhole than the average inclination angle of the second region.Accordingly, it is possible to obtain an opening having a sufficientarea for exposing a portion of the first wiring that is positioned onthe first opening of the through hole on the first surface side. As aresult, during manufacture and after manufacture, it is possible toprevent a disconnection between the first wiring and the second wiringin a portion of the opening of the insulating layer more reliably.

In the semiconductor device according to one aspect of the presentinvention, an average thickness of the insulating layer provided on theinner surface of the through hole may be greater than an averagethickness of the insulating layer provided on the second surface.Accordingly, for example, even if the semiconductor substrate isthinned, since the insulating layer provided on the inner surface of thethrough hole functions as a reinforcing layer, it is possible to ensuresufficient strength of a peripheral portion of the through hole.

In the semiconductor device according to one aspect of the presentinvention, the first region may be a surface of a portion having aheight of ⅔ of a sum of the thickness of the semiconductor substrate andthe average thickness of the insulating layer provided on the secondsurface or less within the insulating layer provided on the innersurface of the through hole. Accordingly, the first region and thesecond region are smoothly connected on the surface of the insulatinglayer, and it is possible to prevent a disconnection of the secondwiring at a boundary between the first region and the second regionreliably.

In the semiconductor device according to one aspect of the presentinvention, the first region may be a surface of a portion having aheight of ½ of a sum of the thickness of the semiconductor substrate andthe average thickness of the insulating layer provided on the secondsurface or less within the insulating layer provided on the innersurface of the through hole. Accordingly, the first region and thesecond region are connected more smoothly on the surface of theinsulating layer, and it is possible to prevent a disconnection of thesecond wiring at a boundary of the first region and the second regionmore reliably.

In the semiconductor device according to one aspect of the presentinvention, the fourth region may be a region having a maximum convexcurvature toward the side opposite the inner surface of the throughhole. Such a shape of the insulating layer is particularly effective forforming a reliable electrical connection via the through hole in thesemiconductor substrate.

In the semiconductor device according to one aspect of the presentinvention, the inner surface of the through hole may be a taperedsurface that enlarges from the first surface to the second surface.Alternatively, the inner surface (when the inner surface of the throughhole is a curved surface such as a cylindrical surface, the tangentialplane of the curved surface) of the through hole may be a surfaceorthogonal to the first surface and the second surface. In either case,it is possible to form a reliable electrical connection via the throughhole in the semiconductor substrate.

In the semiconductor device according to one aspect of the presentinvention, the insulating layer may be made of a resin. Accordingly, itis possible to form an insulating layer having the shape described aboveeasily and reliably.

According to one aspect of the present invention, there is provided amethod of manufacturing a semiconductor device. The method ofmanufacturing a semiconductor device includes a first process in which afirst wiring is provided on a first surface of a semiconductor substratethat has the first surface and a second surface opposite to each other;a second process in which a through hole to extend from the firstsurface to the second surface is formed in the semiconductor substrate,and a portion of the first wiring is exposed to a first opening of thethrough hole on the first surface side; a third process in which aninsulating layer that is continuous through a second opening of thethrough hole on the second surface side is provided on an inner surfaceof the through hole and the second surface; a fourth process in which acontact hole is formed in the insulating layer and a portion of thefirst wiring is exposed to an opening of the insulating layer on thefirst surface side; and a fifth process in which a second wiring isprovided on a surface of the insulating layer and the first wiring andthe second wiring are electrically connected in the opening of theinsulating layer on the first surface side.

According to the method of manufacturing a semiconductor device, it ispossible to efficiently manufacture a semiconductor device in which areliable electrical connection via a through hole in the semiconductorsubstrate is formed.

In the method of manufacturing a semiconductor device according to oneaspect of the present invention, in the third process, a dip coatingmethod is performed using a resin material having a viscosity of 10 cpor more, and thus the insulating layer may be provided on the innersurface of the through hole and the second surface. Accordingly, it ispossible to obtain the insulating layer having the shape described aboveeasily and reliably

In the method of manufacturing a semiconductor device according to oneaspect of the present invention, in the third process, the insulatinglayer may be provided on the inner surface of the through hole and thesecond surface by using a positive resin material. In the fourthprocess, portion corresponding to the contact hole in the insulatinglayer is exposed and developed, and thus the contact hole may be formedin the insulating layer. Accordingly, it is possible to obtain theinsulating layer having the shape described above easily and reliably.

Advantageous Effects of Invention

According to the present invention, it is possible to provide asemiconductor device capable of forming a reliable an electricalconnection via a through hole in a semiconductor substrate and a methodof manufacturing such a semiconductor device.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a cross-sectional view of a semiconductor device according toan embodiment of the present invention.

FIG. 2 is a cross-sectional view of a through hole of the semiconductordevice in FIG. 1 and a peripheral portion thereof.

(a) and (b) of FIG. 3 are cross-sectional views for describing aplurality of processes in a method of manufacturing the semiconductordevice in FIG. 1.

(a) and (b) of FIG. 4 are cross-sectional views for describing aplurality of processes in the method of manufacturing the semiconductordevice in FIG. 1.

(a) and (b) of FIG. 5 are cross-sectional views for describing aplurality of processes in the method of manufacturing the semiconductordevice in FIG. 1.

FIG. 6 is a partial cross-sectional view of a modified example of thesemiconductor device in FIG. 1.

FIG. 7 is a partial cross-sectional view of a modified example of thesemiconductor device in FIG. 1.

FIG. 8 is a partial cross-sectional view of a modified example of thesemiconductor device in FIG. 1.

FIG. 9 is a cross-sectional view of a modified example of a through holeof the semiconductor device in FIG. 1 and a peripheral portion thereof.

DESCRIPTION OF EMBODIMENTS

Embodiments of the present invention will be described below in detailwith reference to the drawings. Here, the same or corresponding portionsin the drawings are denoted with the same reference numerals andredundant descriptions thereof will be omitted.

As shown in FIG. 1, a semiconductor device 1 includes a semiconductorsubstrate 2 including a first surface 2 a and a second surface 2 b thatare opposite to each other. The semiconductor device 1 is an opticaldevice, for example, a silicon photodiode. In the semiconductor device1, in a predetermined region on the first surface 2 a side in thesemiconductor substrate 2 made of, for example, N-type silicon, a P-typeregion 2 c in which P-type impurities are selectively diffused isprovided. On the first surface 2 a of the semiconductor substrate 2, afirst wiring 3 made of, for example, aluminum, is provided with an oxidefilm 4 therebetween. In the oxide film 4, an opening 4 a is formed in aportion corresponding to a pad portion 3 a of the first wiring 3. Anopening 4 b is formed in a portion corresponding to an end of the P-typeregion 2 c in the oxide film 4. The first wiring 3 is electricallyconnected to the P-type region 2 c through the opening 4 b. Here,instead of the oxide film 4, an insulating film made of anotherinsulating material such as SiN may be provided.

A light transmitting substrate 5 made of a light transmitting materialsuch as glass is arranged on the first surface 2 a of the semiconductorsubstrate 2. The semiconductor substrate 2 and the light transmittingsubstrate 5 are optically and physically connected by an adhesive layer6 including an optical adhesive. In the semiconductor device 1, lightenters the P-type region 2 c through the light transmitting substrate 5and the adhesive layer 6. Here, the thickness of the semiconductorsubstrate 2 is smaller (thinner) than the thickness of the lighttransmitting substrate 5. As an example, the thickness of thesemiconductor substrate 2 is about several tens of μm, and the thicknessof the light transmitting substrate 5 is about several hundreds of μm.

In the semiconductor substrate 2, a through hole 7 to extend from thefirst surface 2 a to the second surface 2 b is formed. A first opening 7a of the through hole 7 is positioned on the first surface 2 a of thesemiconductor substrate 2, and a second opening 7 b of the through hole7 is positioned on the second surface 2 b of the semiconductor substrate2. The first opening 7 a is continuous with the opening 4 a of the oxidefilm 4 and is covered with the pad portion 3 a of the first wiring 3. Aninner surface 7 c of the through hole 7 is a tapered surface thatenlarges from the first surface 2 a to the second surface 2 b. Forexample, the through hole 7 is formed in a truncated quadrangularpyramid shape that enlarges from the first surface 2 a to the secondsurface 2 b. Here, when viewed in a direction parallel to a center lineCL of the through hole 7, there is no need to match an edge of the firstopening 7 a of the through hole 7 and an edge of the opening 4 a of theoxide film 4. For example, the edge of the opening 4 a of the oxide film4 may be positioned further inside than the edge of the first opening 7a of the through hole 7.

The aspect ratio of the through hole 7 is 0.2 to 10. The aspect ratio isa value obtained by dividing the depth of the through hole 7 (thedistance between the first opening 7 a and the second opening 7 b) bythe width of the second opening 7 b (the distance between opposite sidesof the second opening 7 b when the second opening 7 b has a rectangularshape, and the diameter of the second opening 7 b when the secondopening 7 b has a circular shape). As an example, the depth of thethrough hole 7 is 30 μm, and the width of the second opening 7 b is 130μm. In this case, the aspect ratio is 0.23.

An insulating layer 10 is provided on the inner surface 7 c of thethrough hole 7 and the second surface 2 b of the semiconductor substrate2. The insulating layer 10 is continuous through the second opening 7 bof the through hole 7. The insulating layer 10 reaches the pad portion 3a of the first wiring 3 through the opening 4 a of the oxide film 4inside the through hole 7 and has an opening 10 a on the first surface 2a side of the semiconductor substrate 2.

On a surface 10 b (a surface on the side opposite the inner surface 7 cof the through hole 7 and the second surface 2 b of the semiconductorsubstrate 2) of the insulating layer 10, a second wiring 8 made of, forexample, aluminum, is provided. The second wiring 8 is electricallyconnected to the pad portion 3 a of the first wiring 3 in the opening 10a of the insulating layer 10. Further, on the surface 10 b (a surface onthe side opposite the second surface 2 b of the semiconductor substrate2) of the insulating layer 10, a third wiring 22 made of, for example,aluminum, is provided. The third wiring 22 is electrically connected tothe second surface 2 b of the semiconductor substrate 2 in an opening 10c formed in the insulating layer 10.

The second wiring 8 and the third wiring 22 are covered with a resinprotective layer 21. A shallow recess 21 a having a smooth inner surfaceis formed in a portion corresponding to the through hole 7 in the resinprotective layer 21. An opening 21 b for exposing a pad portion 8 a isformed in a portion corresponding to the pad portion 8 a of the secondwiring 8 in the resin protective layer 21. An opening 21 c for exposingthe pad portion 22 a is formed in a portion corresponding to a padportion 22 a of the third wiring 22 in the resin protective layer 21. Inthe opening 21 b of the resin protective layer 21, an extractionelectrode 9 that is a bump electrode is arranged. The extractionelectrode 9 is electrically connected to the pad portion 8 a of thesecond wiring 8. In the opening 21 c of the resin protective layer 21,an extraction electrode 23 that is a bump electrode is arranged. Theextraction electrode 23 is electrically connected to the pad portion 22a of the third wiring 22. The semiconductor device 1 is mounted on acircuit substrate through the extraction electrode 9 and the extractionelectrode 23. The extraction electrode 9 and the extraction electrode 23function as an anode electrode and a cathode electrode, respectively.Here, instead of the resin protective layer 21, a protective layer (forexample, an oxide film and a nitride film) made of another insulatingmaterial may be provided. In addition, the thickness of the resinprotective layer 21 may be almost the same as the thickness of theinsulating layer 10 or may be smaller than the thickness of theinsulating layer 10. In particular, when the thickness of the resinprotective layer 21 is almost the same as the thickness of theinsulating layer 10, it is possible to reduce stress applied to thesecond wiring 8 and the third wiring 22.

The insulating layer 10 described above will be described in furtherdetail with reference to FIG. 2. Here, in FIG. 2, the light transmittingsubstrate 5, the adhesive layer 6, the extraction electrode 9, and theresin protective layer 21 are not shown.

As shown in FIG. 2, the surface 10 b of the insulating layer 10 has afirst region 11 that reaches the first opening 7 a inside the throughhole 7, a second region 12 that reaches the second opening 7 b insidethe through hole 7, and a third region 13 that faces the second surface2 b of the semiconductor substrate 2 outside the through hole 7.

The first region 11 is a tapered region that enlarges from the firstsurface 2 a to the second surface 2 b of the semiconductor substrate 2.The first region 11 has an average inclination angle α. When attentionis paid to a region on one side of the center line CL in the planeincluding the center line CL of the through hole 7, the averageinclination angle α of the first region 11 is an average value of anglesformed between an intersection line between the plane and the firstregion 11, and the first surface 2 a. When the intersection line is astraight line, an angle between the straight line and the first surface2 a is the average inclination angle α of the first region 11. When theintersection line is a curved line, an average value of angles betweenthe tangent of the curved line and the first surface 2 a is the averageinclination angle α of the first region 11. The average inclinationangle α of the first region 11 is greater than 0° and smaller than 90°.

The second region 12 is a tapered region that enlarges from the firstsurface 2 a to the second surface 2 b of the semiconductor substrate 2.The second region 12 has an average inclination angle β. When attentionis paid to a region on one side of the center line CL in the planeincluding the center line CL of the through hole 7, the averageinclination angle β of the second region 12 is an average value ofangles between an intersection line between the plane and the secondregion 12, and the first surface 2 a. When the intersection line is astraight line, an angle between the straight line and the first surface2 a is the average inclination angle β of the second region 12. When theintersection line is a curved line, an average value of angles betweenthe tangent of the curved line and the first surface 2 a is the averageinclination angle β of the second region 12. The average inclinationangle β of the second region 12 is greater than 0° and smaller than 90°.

The average inclination angle β of the second region 12 is smaller thanthe average inclination angle α of the first region 11. That is, thesecond region 12 is a region having a gentler inclination than the firstregion 11. In addition, the average inclination angle β of the secondregion 12 is smaller than an average inclination angle γ of the innersurface 7 c of the through hole 7. That is, the second region 12 is aregion having a gentler inclination than the inner surface 7 c of thethrough hole 7. In the present embodiment, the average inclination angleα of the first region 11 is closer to the average inclination angle γ ofthe inner surface 7 c of the through hole 7 than the average inclinationangle β of the second region 12. Here, the relationship of the averageinclination angle α of the first region 11>the average inclination angleγ of the inner surface 7 c of the through hole 7>the average inclinationangle of the second region 12 is established. When attention is paid toa region on one side of the center line CL in the plane including thecenter line CL of the through hole 7, the average inclination angle γ ofthe inner surface 7 c of the through hole 7 is an average value ofangles between an intersection line between the plane and the innersurface 7 c, and the first surface 2 a. When the intersection line is astraight line, an angle between the straight line and the first surface2 a is the average inclination angle γ of the inner surface 7 c of thethrough hole 7. When the intersection line is a curved line, an averagevalue of angles between the tangent of the curved line and the firstsurface 2 a is the average inclination angle γ of the inner surface 7 cof the through hole 7.

The surface 10 b of the insulating layer 10 further has a fourth region14 having a maximum convex curvature toward the side opposite the innersurface 7 c of the through hole 7 and a fifth region 15 along an edge ofthe second opening 7 b of the through hole 7. When attention is paid toa region on one side of the center line CL in the plane including thecenter line CL of the through hole 7, the maximum convex curvaturetoward the side opposite the inner surface 7 c of the through hole 7 isa maximum curvature value of a portion that is curved in a convex shapetoward the side opposite the inner surface 7 c of the through hole 7along the intersection line between the plane and the surface 10 b.Here, the first region 11 is a region on the first opening 7 a side ofthe through hole 7 (the first opening 7 a side in a direction parallelto the center line CL of the through hole 7) relative to the fourthregion 14 within the surface 10 b of the insulating layer 10 provided onthe inner surface 7 c of the through hole 7. The second region 12 is aregion on the second opening 7 b side of the through hole 7 (the secondopening 7 b side in a direction parallel to the center line CL of thethrough hole 7) relative to the fourth region 14 within the surface 10 bof the insulating layer 10 provided on the inner surface 7 c of thethrough hole 7 (that is, a region between the fourth region 14 and thefifth region 15).

The fourth region 14 is curved to continuously connect the first region11 and the second region 12. That is, the fourth region 14 is a roundedcurved surface and smoothly connects the first region 11 and the secondregion 12. Here, if it is assumed that the fourth region 14 is notprovided, when the first region 11 is extended to the second surface 2 bside of the semiconductor substrate 2, and the second region 12 isextended to the first surface 2 a side of the semiconductor substrate 2,an intersection line (a corner or an angulated portion) is formed by thefirst region 11 and the second region 12. The fourth region 14corresponds to a curved surface formed when the intersection line (acorner or an angulated portion) is round-chamfered. When attention ispaid to a region on one side of the center line CL in the planeincluding the center line CL of the through hole 7, the fourth region 14is a portion that is curved in a convex shape toward the side oppositethe inner surface 7 c of the through hole 7 between a portioncorresponding to the first region 11 and a portion corresponding to thesecond region 12 along the intersection line between the plane and thesurface 10 b.

The fifth region 15 is curved to continuously connect the second region12 and the third region 13. That is, the fifth region 15 is a roundedcurved surface and smoothly connects the second region 12 and the thirdregion 13. Here, if it is assumed that the fifth region 15 is notprovided, when the second region 12 is extended to the second surface 2b side of the semiconductor substrate 2 and the third region 13 isextended to the center line CL of the through hole 7, an intersectionline (such as a corner or an angulated portion) is formed by the secondregion 12 and the third region 13. The fifth region 15 corresponds to acurved surface for lied when the intersection line (such as a corner oran angulated portion) is round-chamfered. When attention is paid to aregion on one side of the center line CL in the plane including thecenter line CL of the through hole 7, the fifth region 15 is a portionthat is curved in a convex shape toward the side opposite the edge ofthe second opening 7 b of the through hole 7 between the portioncorresponding to the second region 12 and a portion corresponding to thethird region 13 along the intersection line between the plane and thesurface 10 b.

In the present embodiment, the first region 11, the fourth region 14,and the fifth region 15 are curved surfaces that are curved in a convexshape toward the side opposite the inner surface 7 c of the through hole7. The second region 12 is a curved surface that is curved in a convexshape toward the inner surface 7 c side of the through hole 7 (that is,a curved surface that is curved in a concave shape when viewed from theside opposite the inner surface 7 c of the through hole 7). The thirdregion 13 is a plane substantially parallel to the second surface 2 b ofthe semiconductor substrate 2. As described above, the fourth region 14is curved to continuously connect the first region 11 and the secondregion 12, and the fifth region 15 is curved to continuously connect thesecond region 12 and the third region 13. Therefore, the surface 10 b ofthe insulating layer 10 is a continuous surface (a surface in whichthere is no discontinuous portion such as an intersection line (such asa corner or an angulated portion) between a surface and a surface, andthe regions 11, 12, 13, 14, and 15 are smoothly connected).

An average thickness of the insulating layer 10 provided on the innersurface 7 c of the through hole 7 is greater than an average thicknessof the insulating layer 10 provided on the second surface 2 b of thesemiconductor substrate 2. The average thickness of the insulating layer10 provided on the inner surface 7 c of the through hole 7 is an averagevalue of the thickness of the insulating layer 10 in a directionperpendicular to the inner surface 7 c. The average thickness of theinsulating layer 10 provided on the second surface 2 b of thesemiconductor substrate 2 is an average value of the thickness of theinsulating layer 10 in a direction perpendicular to the second surface 2b.

In a direction parallel to the first surface 2 a and the second surface2 b of the semiconductor substrate 2, an average thickness of theportion corresponding to the first region 11 within the insulating layer10 is greater than an average thickness of the portion corresponding tothe second region 12 within the insulating layer 10. In a directionparallel to the first surface 2 a and the second surface 2 b of thesemiconductor substrate 2, an average thickness of the portioncorresponding to the first region 11 within the insulating layer 10 isan average value of a distance between the first region 11 and the innersurface 7 c of the through hole 7 in that direction. In a directionparallel to the first surface 2 a and the second surface 2 b of thesemiconductor substrate 2, an average thickness of the portioncorresponding to the second region 12 within the insulating layer 10 isan average value of a distance between the second region 12 and theinner surface 7 c of the through hole 7 in that direction.

In the insulating layer 10, the first region 11 is a surface of aportion having a height H from the first surface 2 a of thesemiconductor substrate 2 within the insulating layer 10 provided on theinner surface 7 c of the through hole 7. The height H is ½ of a sum D ofthe thickness of the semiconductor substrate 2 (that is, a distancebetween the first surface 2 a and the second surface 2 b) and theaverage thickness of the insulating layer 10 provided on the secondsurface 2 b of the semiconductor substrate 2 or less.

In the insulating layer 10, when a surface S passing through an edge ofthe opening 10 a of the insulating layer 10 and the edge of the secondopening 7 b of the through hole 7 is set as a boundary surface, and aportion P1 on the inner surface 7 c side of the through hole 7 withrespect to the surface S and a portion P2 on the side opposite the innersurface 7 c of the through hole 7 with respect to the surface S arefocused on, the volume of the portion P1 is larger than the volume ofthe portion P2. In addition, in the insulating layer 10, when attentionis paid to a region on one side of the center line CL in the planeincluding the center line CL of the through hole 7, an area of atriangle T1 is larger than an area of a triangle T2. The triangle T1 isa triangle with vertices at the edge of the first opening 7 a of thethrough hole 7, the edge of the second opening 7 b of the through hole7, and the edge of the opening 10 a of the insulating layer 10 on aplane including the center line CL of the through hole 7 (that is, inthe cross section in FIG. 2). The triangle T2 is a triangle withvertices at the edge of the opening 10 a of the insulating layer 10, theedge of the second opening 7 b of the through hole 7, and the top of thefourth region 14 on a plane including the center line CL of the throughhole 7 (that is, in the cross section in FIG. 2).

As described above, in the semiconductor device 1, the first region 11that reaches the first opening 7 a of the through hole 7 and the secondregion 12 that reaches the second opening 7 b of the through hole 7within the surface 10 b of the insulating layer 10 are tapered regionsthat enlarge from the first surface 2 a to the second surface 2 b of thesemiconductor substrate 2. Thus, the average inclination angle of thesecond region 12 is smaller than an average inclination angle of theinner surface 7 c of the through hole 7. Accordingly, an angle betweenthe third region 13 that faces the second surface 2 b of thesemiconductor substrate 2 and the second region 12 that reaches thesecond opening 7 b of the through hole 7 within the surface 10 b of theinsulating layer 10 is greater (that is, gentler) than an angle betweenthe second surface 2 b of the semiconductor substrate 2 and the innersurface 7 c of the through hole 7. Therefore, during manufacture andafter manufacture, a disconnection of the second wiring 8 in a portionof the second opening 7 b of the through hole 7 is prevented. Inaddition, for example, compared to when the insulating layer 10 isformed with a uniform thickness along the inner surface 7 c of thethrough hole 7, since the inclination of the second region 12 becomesgentler, it is possible to form the second wiring 8 easily and reliably.Further, since it is possible to form the second wiring 8 withoutdepending on the shape of the inner surface 7 c of the through hole 7,for example, even if a pointed portion remains on the inner surface 7 cof the through hole 7, it is possible to prevent a disconnection of thesecond wiring 8 caused by such a portion. In addition, the averageinclination angle of the second region 12 is smaller than the averageinclination angle of the first region 11. In other words, the averageinclination angle of the first region 11 that reaches the first opening7 a of the through hole 7 is greater than the average inclination angleof the second region 12. Accordingly, for example, even if the diameterof the through hole 7 is reduced, a sufficient area of the opening 10 aof the insulating layer 10 on the first surface 2 a side of thesemiconductor substrate 2 is ensured. Therefore, during manufacture andafter manufacture, a disconnection between the first wiring 3 and thesecond wiring 8 in a portion of the opening 10 a of the insulating layer10 is prevented. Further, on the surface 10 b of the insulating layer10, the fourth region 14 is curved to continuously connect the firstregion 11 and the second region 12, and the fifth region 15 is curved tocontinuously connect the second region 12 and the third region 13.Therefore, during manufacture and after manufacture, a disconnection ofthe second wiring 8 is prevented in the entire region of the surface 10b of the insulating layer 10. In particular, after manufacture, sincethe stress concentration in the entire region of the surface 10 b of theinsulating layer 10 is reduced, it is effective to prevent adisconnection of the second wiring 8. As described above, according tothe semiconductor device 1, a reliable electrical connection via thethrough hole 7 in the semiconductor substrate 2 can be formed.

In the semiconductor device 1, the surface 10 b of the insulating layer10 is a continuous surface (a surface in which there is no discontinuousportion such as an intersection line (such as a corner or a bentportion) between a surface and a surface, and the regions 11, 12, 13,14, and 15 are smoothly connected). Accordingly, the stressconcentration is reduced so that a disconnection of the second wiring 8can be prevented.

In the semiconductor device 1, the average inclination angle of thefirst region 11 is closer to the average inclination angle of the innersurface 7 c of the through hole 7 than the average inclination angle ofthe second region 12. Accordingly, it is possible to obtain the opening10 a having a sufficient area for exposing the pad portion 3 a of thefirst wiring 3. As a result, during manufacture and after manufacture,it is possible to prevent a disconnection between the first wiring 3 andthe second wiring 8 in a portion of the opening 10 a of the insulatinglayer 10 more reliably.

In the semiconductor device 1, the relationship of the averageinclination angle α of the first region 11>the average inclination angleγ of the inner surface 7 c of the through hole 7>the average inclinationangle β of the second region 12 is established. Accordingly, it ispossible to prevent a disconnection of the second wiring 8 and it ispossible to obtain the opening 10 a having a sufficient area forexposing the pad portion 3 a of the first wiring 3.

In the semiconductor device 1, the average thickness of the insulatinglayer 10 provided on the inner surface 7 c of the through hole 7 isgreater than the average thickness of the insulating layer 10 providedon the second surface 2 b. Accordingly, for example, even if thesemiconductor substrate 2 is thinned, since the insulating layer 10provided on the inner surface 7 c of the through hole 7 functions as areinforcing layer, it is possible to ensure sufficient strength of aperipheral portion of the through hole 7. In addition, it is possible toset an average inclination angle of the first region 11 and an averageinclination angle of the second region 12 to a desired angle, and it ispossible to obtain the insulating layer 10 in which the surface 10 b isa continuous surface (a surface in which there is no discontinuousportion such as an intersection line (such as a corner or a bentportion) between a surface and a surface, and the regions 11, 12, 13,14, and 15 are smoothly connected). For example, when the insulatinglayer 10 is formed with a uniform thickness along the inner surface 7 cof the through hole 7, it is not possible to obtain the insulating layer10 in which the surface 10 b is a continuous surface.

In the semiconductor device 1, in a direction parallel to the firstsurface 2 a and the second surface 2 b of the semiconductor substrate 2,an average thickness of the portion corresponding to the first region 11within the insulating layer 10 is greater than an average thickness ofthe portion corresponding to the second region 12 within the insulatinglayer 10. Accordingly, it is possible to obtain the insulating layer 10having a shape in which a disconnection of the second wiring 8 does noteasily occur and a disconnection between the first wiring 3 and thesecond wiring 8 does not easily occur.

In the semiconductor device 1, for example, even if an overhang or thelike remains on the edge of the second opening 7 b of the through hole7, the overhang or the like is covered with the insulating layer 10, andthe second wiring 8 is provided on the fifth region 15 that is a curvedsurface curved in a convex shape. Accordingly, it is possible toreliably prevent a disconnection of the second wiring 8 in a portion ofthe second opening 7 b of the through hole 7.

In the semiconductor device 1, within the insulating layer 10 providedon the inner surface 7 c of the through hole 7, a surface of a portionhaving a height H that is ½ of a sum D of the thickness of thesemiconductor substrate 2 and the average thickness of the insulatinglayer 10 provided on the second surface 2 b or less is the first region11. Accordingly, on the surface 10 b of the insulating layer 10, thefirst region 11 and the second region 12 are smoothly connected, and itis possible to reliably prevent a disconnection of the second wiring 8at a boundary between the first region 11 and the second region 12.

In the insulating layer 10 of the semiconductor device 1, when thesurface S passing through the edge of the opening 10 a of the insulatinglayer 10 and the edge of the second opening 7 b of the through hole 7 isset as a boundary surface, and the portion P1 on the inner surface 7 cside of the through hole 7 with respect to the surface S and the portionP2 on the side opposite the inner surface 7 c of the through hole 7 withrespect to the surface S are focused on, the volume of the portion P1 islarger than the volume of the portion P2. In addition, when attention ispaid to a region on one side of the center line CL in the planeincluding the center line CL of the through hole 7, the area of thetriangle T1 is larger than the area of the triangle T2. Accordingly, onthe surface 10 b of the insulating layer 10, the first region 11 and thesecond region 12 are smoothly connected, and it is possible to reliablyprevent a disconnection of the second wiring 8 at a boundary between thefirst region 11 and the second region 12.

In the semiconductor device 1, within the surface 10 b of the insulatinglayer 10 provided on the inner surface 7 c of the through hole 7, aregion on the first opening 7 a side relative to the fourth region 14having the maximum convex curvature toward the side opposite the innersurface 7 c of the through hole 7 is the first region 11, and a regionon the second opening 7 b side relative to the fourth region 14 is thesecond region 12. Such a shape of the insulating layer 10 isparticularly effective for forming a reliable electrical connection viathe through hole 7 in the semiconductor substrate 2.

In the semiconductor device 1, the inner surface 7 c of the through hole7 is a tapered surface that enlarges from the first surface 2 a to thesecond surface 2 b. In this case, a reliable electrical connection viathe through hole 7 in the semiconductor substrate 2 can be formed.

In the semiconductor device 1, the insulating layer 10 is made of aresin. Accordingly, it is possible to form the insulating layer 10having the shape described above easily and reliably.

Next, a method of manufacturing the semiconductor device 1 describedabove will be described with reference to FIG. 3 to FIG. 5. First, thesemiconductor substrate 2 is prepared, and a device is formed on thefirst surface 2 a of the semiconductor substrate 2 (that is, the oxidefilm 4, the first wiring 3, and the like are provided on the firstsurface 2 a) (first process). Then, the light transmitting substrate 5is attached to the first surface 2 a of the semiconductor substrate 2with the adhesive layer 6 therebetween.

Subsequently, as shown in (a) of FIG. 3, the through hole 7 is formed inthe semiconductor substrate 2 by anisotropic wet etching. Further, asshown in (b) of FIG. 3, a portion corresponding to the pad portion 3 aof the first wiring 3 in the oxide film 4 is removed, and the opening 4a is formed in the oxide film 4. Accordingly, the pad portion 3 a of thefirst wiring 3 is exposed to the first opening 7 a of the through hole 7(second process). Here, when viewed in a direction parallel to thecenter line CL of the through hole 7, there is no need to form theopening 4 a in the oxide film 4 to match the edge of the first opening 7a of the through hole 7 and, for example, the opening 4 a may be formedin the oxide film 4 so that the edge of the opening 4 a of the oxidefilm 4 is positioned further inside than the edge of the first opening 7a of the through hole 7.

Subsequently, a positive resin material having a viscosity of 10 cp ormore is prepared, and a dip coating method (a method of immersing anobject in a resin paint, pulling the object out of the resin paint, andthus forming a resin layer on the object) is performed using the resinmaterial, and thus, as shown in (a) of FIG. 4, the insulating layer 10is provided on the inner surface 7 c of the through hole 7 and thesecond surface 2 b of the semiconductor substrate 2 (third process).Accordingly, in the insulating layer 10, a recess 17 having an innersurface that follows the second region 12, the third region 13, and thefifth region 15 is formed. Here, as the resin material, for example, aphenolic resin, a polyimide resin, or an epoxy resin can be used.

Subsequently, as shown in (b) of FIG. 4, a mask 30 is arranged on theinsulating layer 10 provided on the second surface 2 b of thesemiconductor substrate 2. The mask 30 has a light transmitting portion31 at a position that faces the pad portion 3 a of the first wiring 3and a light blocking portion 32 around the light transmitting portion31. Subsequently, light is emitted to a portion corresponding to thecontact hole 16 in the insulating layer 10 through the lighttransmitting portion 31 of the mask 30 and the portion is exposed.Further, when the portion corresponding to the contact hole 16 in theinsulating layer 10 is developed, the contact hole 16 is formed in theinsulating layer 10. Accordingly, the pad portion 3 a of the firstwiring 3 is exposed to the opening 10 a of the insulating layer 10(fourth process). Here, when the contact hole 16 is formed, an ashingtreatment may be performed in combination.

During exposure, a gap is formed due to the recess 17 formed in theinsulating layer 10 between the light transmitting portion 31 of themask 30 and the portion corresponding to the contact hole 16 in theinsulating layer 10. Accordingly, light is diffracted and emitted to theinsulating layer 10. Therefore, during development, the tapered firstregion 11 that enlarges from the first surface 2 a to the second surface2 b of the semiconductor substrate 2 and the contact hole 16 having aninner surface that follows the second region 12 are formed.

Subsequently, as shown in (a) of FIG. 5, for example, when a sputteringmethod using aluminum is performed, the second wiling 8 is provided onthe surface 10 b of the insulating layer 10, and the first wiring 3 andthe second wiring 8 are electrically connected in the opening 10 a ofthe insulating layer 10 (fifth process). In this case, since the contacthole 16 has an inner surface following the tapered first region 11 thatenlarges from the first surface 2 a to the second surface 2 b of thesemiconductor substrate, a metal film is also reliably formed on theinner surface, and additionally, the first wiring 3 and the secondwiring 8 are reliably connected in the opening 10 a of the insulatinglayer 10.

Subsequently, for example, a dip coating method is performed using thesame resin material as that of the insulating layer 10, and thus, asshown in (b) of FIG. 5, the second wiring 8 is covered with the resinprotective layer 21. Finally, the extraction electrode 9 is arranged inthe pad portion 8 a of the second wiring 8 that is not covered with theresin protective layer 21 and the semiconductor device 1 described aboveis obtained.

According to the method of manufacturing the semiconductor device 1, itis possible to efficiently manufacture the semiconductor device 1 inwhich a reliable electrical connection is formed via the through hole 7in the semiconductor substrate 2.

In the method of manufacturing the semiconductor device 1, the dipcoating method is performed using a resin material having a viscosity of10 cp or more, and thus the insulating layer 10 is provided on the innersurface 7 c of the through hole 7 and the second surface 2 b of thesemiconductor substrate 2. Accordingly, it is possible to obtain theinsulating layer 10 having the shape described above easily andreliably.

Here, in the dip coating method, a low viscosity resin material (forexample, a resin material used for a water repellent coating, forexample, a resin material having a viscosity of 1 cp or less) isgenerally used. However, even if the dip coating method is performedusing such a resin material, the insulating layer 10 is formed withsubstantially a uniform thickness along the inner surface 7 c of thethrough hole 7. Thus, in the method of manufacturing the semiconductordevice 1, when the dip coating method is performed using a resinmaterial having a viscosity of 10 cp or more, it is possible to obtainthe insulating layer 10 having the shape described above easily andreliably.

In the method of manufacturing the semiconductor device 1, using thepositive resin material, the insulating layer 10 is provided on theinner surface 7 c of the through hole 7 and the second surface 2 b ofthe semiconductor substrate 2. Then, the portion corresponding to thecontact hole 16 in the insulating layer 10 is exposed and developed, andthus the contact hole 16 is formed in the insulating layer 10.Accordingly, it is possible to obtain the insulating layer 10 having theshape described above easily and reliably. Here, during exposure anddevelopment, since the thickness of the portion corresponding to thecontact hole 16 in the insulating layer 10 becomes thinner (that is,since the portion corresponding to the contact hole 16 is a portionhaving a height H of ½ of a sum D of the thickness of the semiconductorsubstrate 2 and the average thickness of the insulating layer 10provided on the second surface 2 b or less within the insulating layer10) due to the recess 17 formed in the insulating layer 10, it ispossible to obtain the contact hole 16 having a desired shape easily andreliably.

In the method of manufacturing the semiconductor device 1, while thelight transmitting substrate 5 is attached to the semiconductorsubstrate 2, the dip coating method is performed. Thus, the thinnedsemiconductor substrate 2 can be used. In the thinned semiconductorsubstrate 2, since the depth of the through hole 7 is reduced, even ifthe insulating layer 10 is thickened according to the dip coating methodusing a resin material having a high viscosity at 10 cp or more, it ispossible to form the contact hole 16 in the insulating layer 10 easilyand reliably.

While one embodiment of the present invention has been described above,the present invention is not limited to the above embodiment. Forexample, the insulating layer 10 may be made of an insulating materialother than a resin. In addition, while the first opening 7 a of thethrough hole 7 is covered with the pad portion 3 a of the first wiring 3in the above embodiment, a portion of the first wiring 3 may bepositioned above the first opening 7 a, and the first wiring 3 may notcover the entire region of the first opening 7 a.

In addition, in the above embodiment, the average inclination angle ofthe first region 11 is closer to the average inclination angle of theinner surface 7 c of the through hole 7 than the average inclinationangle of the second region 12. However, the average inclination angle ofthe second region 12 may be closer to the average inclination angle ofthe inner surface 7 c of the through hole 7 than the average inclinationangle of the first region 11.

In addition, as shown in FIG. 6, the light transmitting substrate 5 maynot be attached to the first surface 2 a of the semiconductor substrate2 with the adhesive layer 6 therebetween. In this case, an oxide film 18is provided on the first surface 2 a to cover the first wiring 3. Inthis manner, when the light transmitting substrate 5 is not attached tothe semiconductor substrate 2, since a portion having a height H fromthe first surface 2 a in the insulating layer 10 functions as areinforcing layer, this is particularly effective in consideration ofensuring sufficient strength of a peripheral portion of the through hole7.

In addition, as shown in FIG. 7 and FIG. 8, the extraction electrode 9may be arranged inside the through hole 7 to protrude from the secondsurface 2 b of the semiconductor substrate 2. In this case, as shown inFIG. 7, the light transmitting substrate 5 may be attached to the firstsurface 2 a of the semiconductor substrate 2 with the adhesive layer 6therebetween. Alternatively, as shown in FIG. 8, the light transmittingsubstrate 5 may not be attached to the first surface 2 a of thesemiconductor substrate 2 with the adhesive layer 6 therebetween.

In addition, as shown in FIG. 9, the inner surface 7 c of the throughhole 7 (when the inner surface 7 c of the through hole 7 is a curvedsurface such as a cylindrical surface, the tangential plane of thecurved surface) may be a surface orthogonal to the first surface 2 a andthe second surface 2 b. In this case, a reliable electrical connectionvia the through hole 7 in the semiconductor substrate 2 can be formed.Here, the aspect ratio of the through hole 7 is 0.2 to 10. As anexample, the depth of the through hole 7 is 40 μm, and the width of thesecond opening 7 b is 30 μm. In this case, the aspect ratio is 1.3.Here, the through hole 7 having a shape such as a cylindrical shape or aquadrangular prism shape is formed by, for example, dry etching.

In the through hole 7 shown in FIG. 9, the average inclination angle βof the second region 12 is smaller than the average inclination angle αof the first region 11, and is also smaller than the average inclinationangle γ (in this case, 90°) of the inner surface 7 c of the through hole7. That is, the second region 12 is a region that has a gentlerinclination than the first region 11 and has a gentler inclination thanthe inner surface 7 c of the through hole 7. In addition, the averageinclination angle α of the first region 11 is closer to the averageinclination angle γ of the inner surface 7 c of the through hole 7 thanthe average inclination angle β of the second region 12. Here, therelationship of the average inclination angle γ of the inner surface 7 cof the through hole 7>the average inclination angle α of the firstregion 11>the average inclination angle β of the second region 12 isestablished. Accordingly, it is possible to prevent a disconnection ofthe second wiring 8 and it is possible to obtain the opening 10 a havinga sufficient area for exposing the pad portion 3 a of the first wiring3. In addition, the surface 10 b of the insulating layer 10 is acontinuous surface (a surface in which there is no discontinuous portionsuch as an intersection line (such as a corner or a bent portion)between a surface and a surface, and the regions 11, 12, 13, 14, and 15are smoothly connected). In addition, in the insulating layer 10, whenthe surface S passing through the edge of the opening 10 a of theinsulating layer 10 and the edge of the second opening 7 b of thethrough hole 7 is set as a boundary surface, and the portion P1 on theinner surface 7 c side of the through hole 7 with respect to the surfaceS and the portion P2 on the side opposite the inner surface 7 c of thethrough hole 7 with respect to the surface S are focused on, the volumeof the portion P1 is larger than the volume of the portion P2. Inaddition, in the insulating layer 10, when attention is paid to a regionon one side of the center line CL in the plane including the center lineCL of the through hole 7, an area of the triangle T1 is larger than anarea of the triangle T2. In addition, in a direction parallel to thefirst surface 2 a and the second surface 2 b of the semiconductorsubstrate 2, an average thickness of the portion corresponding to thefirst region 11 within the insulating layer 10 is greater than anaverage thickness of the portion corresponding to the second region 12within the insulating layer 10.

In addition, the first region 11 may be the surface 10 b of a portionhaving a height H of ⅔ of a sum D of the thickness of the semiconductorsubstrate 2 and the average thickness of the insulating layer 10provided on the second surface 2 b of the semiconductor substrate 2 orless within the insulating layer 10 provided on the inner surface 7 c ofthe through hole 7 (refer to FIG. 9). In this case, on the surface 10 bof the insulating layer 10, the first region 11 and the second region 12are smoothly connected, and it is possible to reliably prevent adisconnection of the second wiring 8 at a boundary between the firstregion 11 and the second region 12. Here, during exposure anddevelopment, since the thickness of the portion corresponding to thecontact hole 16 in the insulating layer 10 becomes thinner (that is,since the portion corresponding to the contact hole 16 is a portionhaving a height H of ⅔ of a sum D of the thickness of the semiconductorsubstrate 2 and the average thickness of the insulating layer 10provided on the second surface 2 b or less within the insulating layer10) due to the recess 17 formed in the insulating layer 10, it ispossible to obtain the contact hole 16 having a desired shape easily andreliably.

In addition, in the method of manufacturing the semiconductor device 1,the dip coating method is performed, and thus the insulating layer 10 isprovided on the inner surface 7 c of the through hole 7 and the secondsurface 2 b of the semiconductor substrate 2. However, the presentinvention is not limited thereto. For example, the insulating layer 10may be provided on the inner surface 7 c of the through hole 7 and thesecond surface 2 b of the semiconductor substrate 2 by performinganother method such as a lamination method using a resin sheet and aspin coating method using a resin paint.

In addition, in the method of manufacturing the semiconductor device 1,the insulating layer 10 is provided on the inner surface 7 c of thethrough hole 7 and the second surface 2 b of the semiconductor substrate2 using the positive resin material, and the portion corresponding tothe contact hole 16 in the insulating layer 10 is exposed and developed,and thus the contact hole 16 is formed in the insulating layer 10.However, the present invention is not limited thereto. For example,using a negative-type resin material, the insulating layer 10 may beprovided on the inner surface 7 c of the through hole 7 and the secondsurface 2 b of the semiconductor substrate 2. In this case, a portionother than the portion corresponding to the contact hole 16 in theinsulating layer 10 is exposed, and the portion corresponding to thecontact hole 16 in the insulating layer 10 is developed so that thecontact hole 16 may be formed in the insulating layer 10. The taperedcontact hole 16 that enlarges from the second surface 2 b to the firstsurface 2 a of the semiconductor substrate 2 may be formed simply by thedevelopment according to light attenuation, light diffraction, and thelike. However, when a heat treatment or the like is additionallyperformed, it is possible to obtain the tapered contact hole 16 thatenlarges from the first surface 2 a to the second surface 2 b of thesemiconductor substrate 2.

In addition, in the above embodiment, the P-type region 2 c in whichP-type impurities are selectively diffused is provided in apredetermined region on the first surface 2 a side in the semiconductorsubstrate 2 including, for example, N-type silicon. However,conductivity-types may be vice versa. In this case, the extractionelectrode 9 and the extraction electrode 23 function as a cathodeelectrode and an anode electrode, respectively. Further, there is nolimitation to a structure in which a second-conductivity-type (the otherof the P-type and the N-type) region is formed in afirst-conductivity-type (one of the P-type and the N-type) semiconductorsubstrate 2, and a structure in which a second-conductivity-type (theother of the P-type and the N-type) semiconductor layer is formed on afirst-conductivity-type (one of the P-type and the N-type) semiconductorsubstrate 2 or a structure in which a first-conductivity-type (one ofthe P-type and the N-type) semiconductor layer is formed on a substrateof a second-conductivity-type (the other of the P-type and the N-type)semiconductor layer formed on the first-conductivity-type semiconductorlayer may be used. That is, the second-conductivity-type region may beformed on the first-conductivity-type region of the semiconductorsubstrate 2. In addition, in the above embodiment, the semiconductordevice 1 is an optical device, for example, a silicon photodiode.However, the semiconductor device 1 may be another optical device, ormay be an electronic device, or the like.

INDUSTRIAL APPLICABILITY

According to the present invention, it is possible to provide asemiconductor device capable of forming a reliable an electricalconnection via a through hole in a semiconductor substrate and a methodof manufacturing such a semiconductor device.

REFERENCE SIGNS LIST

1: Semiconductor device, 2: Semiconductor substrate, 2 a: First surface,2 b: Second surface, 3: First wiring, 7: Through hole, 7 a: Firstopening, 7 b: Second opening, 7 c: Inner surface, 8: Second wiring, 10:Insulating layer, 10 a: Opening, 10 b: Surface, 11: First region, 12:Second region, 13: Third region, 14: Fourth region, 15: Fifth region,16: Contact hole.

The invention claimed is:
 1. A semiconductor device comprising: asemiconductor substrate that has a first surface and a second surfaceopposite to each other and in which a through hole to extend from thefirst surface to the second surface is formed; a first wiring that isprovided on the first surface and has a portion located above a firstopening of the through hole on the first surface side; an insulatinglayer that is provided on an inner surface of the through hole and thesecond surface and is continuous through a second opening of the throughhole on the second surface side; and a second wiring that is provided ona surface of the insulating layer and is electrically connected to thefirst wiring in an opening of the insulating layer on the first surfaceside, wherein the surface of the insulating layer includes a taperedfirst region that reaches the first opening inside the through hole andenlarges from the first surface to the second surface, a tapered secondregion that reaches the second opening inside the through hole andenlarges from the first surface to the second surface, a third regionthat faces the second surface outside the through hole, a fourth regionthat is curved to continuously connect the first region and the secondregion, and a fifth region that is curved to continuously connect thesecond region and the third region, wherein an average inclination angleof the second region is smaller than an average inclination angle of thefirst region and is smaller than an average inclination angle of aportion of the inner surface of the through hole corresponding to thesecond region, and wherein a thickness of the insulating layer in thesecond region in a direction parallel to the first surface and thesecond surface increases toward the first opening.
 2. The semiconductordevice according to claim 1, wherein the average inclination angle ofthe first region is closer to the average inclination angle of the innersurface of the through hole than the average inclination angle of thesecond region.
 3. The semiconductor device according to claim 1, whereinan average thickness of the insulating layer provided on the innersurface of the through hole is greater than an average thickness of theinsulating layer provided on the second surface.
 4. The semiconductordevice according to claim 1, wherein the first region is a surface of aportion of the insulating layer having a height of ⅔ or less of a sum ofthe thickness of the semiconductor substrate and the average thicknessof the insulating layer provided on the second surface.
 5. Thesemiconductor device according to claim 4, wherein the first region hasa height of ½ or less of the sum of the thickness of the semiconductorsubstrate and the average thickness of the insulating layer provided onthe second surface.
 6. The semiconductor device according to claim 1,wherein the fourth region is a region having a maximum convex curvaturetoward the side opposite the inner surface of the through hole.
 7. Thesemiconductor device according to claim 1, wherein the inner surface ofthe through hole is a tapered surface that enlarges from the firstsurface to the second surface.
 8. The semiconductor device according toclaim 1, wherein the inner surface of the through hole is a surfaceorthogonal to the first surface and the second surface.
 9. Thesemiconductor device according to claim 1, wherein the insulating layeris made of a resin.
 10. A method of manufacturing a semiconductor deviceaccording to claim 1, comprising a first process in which a first wiringis provided on a first surface of a semiconductor substrate that has thefirst surface and a second surface opposite to each other; a secondprocess in which a through hole to extend from the first surface to thesecond surface is formed in the semiconductor substrate, and a portionof the first wiring is exposed to a first opening of the through hole onthe first surface side; a third process in which an insulating layerthat is continuous through a second opening of the through hole on thesecond surface side is provided on an inner surface of the through holeand the second surface; a fourth process in which a contact hole isformed in the insulating layer and the portion of the first wiring isexposed to an opening of the insulating layer on the first surface side;a fifth process in which a second wiring is provided on a surface of theinsulating layer and the first wiring and the second wiring areelectrically connected in the opening of the insulating layer on thefirst surface side.
 11. The method of manufacturing a semiconductordevice according to claim 10, wherein, in the third process, a dipcoating method is performed using a resin material having a viscosity of10 cp or more, and thus the insulating layer is provided on the innersurface of the through hole and the second surface.
 12. The method ofmanufacturing a semiconductor device according to claim 10, wherein, inthe third process, the insulating layer is provided on the inner surfaceof the through hole and the second surface by using a positive resinmaterial, and wherein, in the fourth process, a portion corresponding tothe contact hole in the insulating layer is exposed and developed, andthus the contact hole is formed in the insulating layer.